X-RAY STANDING WAVES AT GLANCING INCIDENCE FOR OVERLAYER CHARACTERIZATION

New possibilities of overlayer structure study with the help of XRSW g enerator at total reflection conditions above the mirror surface or at Bragg diffraction in LSM are presented. The advantages of a new ampli tude modulated XRSW over the surface of a wave-guide layered structure are revealed and used for organic monolayer characterization. The ori ginal technique for obtaining ultra-thin film thickness with high prec ision is demonstrated using LSM as XRSW generator.