T. Matsukawa et al., TOTAL-DOSE DEPENDENCE OF SOFT-ERROR HARDNESS IN 64KBIT SRAMS EVALUATED BY SINGLE-ION MICROPROBE TECHNIQUE, IEEE transactions on nuclear science, 41(6), 1994, pp. 2071-2076
Total dose effect on the soft-error susceptibility of 64kbit CMOS SRAM
has been investigated by using the single ion microprobe technique wh
ich enables us to get a map of soft-error sensitivity in a memory cell
by hitting a micron-size area with single ions. The effects of the io
n dose on the susceptibility of each error-sensitive site have been ev
aluated. The errors due to the upset of p-MOSFETs have become more sus
ceptible at higher dose while that of the n-MOSFETs less susceptible.
One of the origins of the errors are the negative threshold voltage(V-
th) shifts of the MOSFETs which are caused by oxide trapped charges. D
isplacement damage induced by ion irradiation also affects the suscept
ibility to the soft-error.