GERMANIUM CONTENT DEPENDENCE OF RADIATION-DAMAGE IN STRAINED SI1-XGEXEPITAXIAL DEVICES

Citation
H. Ohyama et al., GERMANIUM CONTENT DEPENDENCE OF RADIATION-DAMAGE IN STRAINED SI1-XGEXEPITAXIAL DEVICES, IEEE transactions on nuclear science, 41(6), 1994, pp. 2437-2442
Citations number
12
Categorie Soggetti
Nuclear Sciences & Tecnology","Engineering, Eletrical & Electronic
ISSN journal
00189499
Volume
41
Issue
6
Year of publication
1994
Part
1
Pages
2437 - 2442
Database
ISI
SICI code
0018-9499(1994)41:6<2437:GCDORI>2.0.ZU;2-G
Abstract
The irradiation damage in n(+)-Si/p(+)-Si1-xGex epitaxial diodes and n (+)-Si/p(+)-Si1-xGex/n-Si epitaxial heterojunction bipolar transistors (HBTs) by fast neutrons and MeV electrons is studied as a function of fluence and germanium content for the first time. The degradation of the electrical performance of both diodes and HBTs by irradiation incr eases with increasing fluence, while it decreases with increasing germ anium content. The damage coefficient of reverse current for x = 0.12 and 0.16 diodes irradiated by neutrons is calculated to be 6.2 x 10(-2 1) and 5.5 x 10(-21) n(-1)Acm(2), respectively. That of h(FE) for elec tron-irradiated x = 0.08, 0.12 and 0.16 HBTs is 7.6 x 10(-16), 2.7 x 1 0(-16) and 1.6 x 10(-16) e(-1)cm(2), respectively.