An analysis is made of the growth of threshold voltage as a function o
f radiation dose in a very wide range of Complementary Metal-Oxide Sem
iconductor (CMOS) devices, all the way from low (kilorad) to very high
(gigarad) doses. It is found that such results can be organized into
four LANES OR CORRIDORS on the growth curve diagram. The resulting FOU
R-LANE CLASSIFICATION is useful in selecting CMOS technologies and off
ers a new terminology for describing the radiation tolerance of ICs, n
amely ''Old Soft, New Soft, Tolerant and Very Tolerant''. The form of
the lanes, though arrived at empirically, is consistent with the curre
nt theory of radiation response of MOS structures. The position of a d
evice test result in this framework is a useful indication of the suit
ability of a device for use in a given radiation environment and could
form the basis of a ''league table'', used to assess the performance
of ''hardening laboratories'' around the world and as a reference sour
ce for the properties of thin-film oxide materials.