STUDY OF THIN-FILMS OF SIO2 PREPARED VIA THE LOW-TEMPERATURE PLASMOCHEMICAL DEPOSITION

Authors
TIMOFEEV FN BOZKURT K GYURE M AIDINLI A SYUZAR S ELLIOLTIOGLY R TYURKOGLY K
Citation
Fn. Timofeev et al., STUDY OF THIN-FILMS OF SIO2 PREPARED VIA THE LOW-TEMPERATURE PLASMOCHEMICAL DEPOSITION, Pis'ma v Zurnal tehniceskoj fiziki, 20(14), 1994, pp. 51-56
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Pis'ma v Zurnal tehniceskoj fiziki → ACNP
ISSN journal
03200116
Volume
20
Issue
14
Year of publication
1994
Pages
51 - 56
Database
ISI
SICI code
0320-0116(1994)20:14<51:SOTOSP>2.0.ZU;2-O