SENSITIVE LIGHT-SCATTERING AS A SEMIQUANTITATIVE METHOD FOR STUDYING PHOTORESIST STRIPPING

Sensitive light scattering measurements are used to quantify the amoun t of residues after photoresist stripping on different substrates. The high sensitivity of this technique provides unique information regard ing the efficiency of several stripping procedures by identifying phot oresist traces that could not be easily detected by other methods. The proposed procedure permits the optimization of photoresist contaminat ion removal steps like dry and wet stripping on a quantitative basis.