The PdCu(110) plane, with Pd:Cu = 1:1 in the bulk, was prepared to hav
e various surface compositions by applying cycles of argon ion sputter
ing (ion energy of less than or equal to 750 eV with ion current densi
ties less than or equal to 1 mu A/cm(2)) and annealing temperatures (T
-AN) Of 420 < T < 820 K. With this preparation method different compos
itions of the top surface layers (TL) were obtained: (i) exclusively P
d atoms, (ii) composition of various Cu/Pd ratios, including the bulk
ratio; and (iii) exclusively Cu atoms. The surface region (SR) of simi
lar to 4 layers depth analysed by AES, and the CO TDS used for TL-char
acterization, allowed the average ratio of Cu/Pd in the next three sub
surface layers (3SSL) to be evaluated LEED enabled the determination o
f the surface structure after each step. The high temperature treatmen
t of the surface followed by low temperature sputtering (T-SP) and T-A
N below that of Cu segregation (T-SEG) similar to 550 K, produced a sm
ooth Pd-rich surface. On the other hand, a large number of sputtering
and annealing cycles without prior high T-AN produced a rough surface,
enabling the Cu atoms lying beneath the TL to be accessible for surfa
ce reactions. A diagram describing LEED structures can be drawn from t
he results which present the large variety of surface structures for t
he clean PdCu(110) single crystal surface depending on the T-SP and T-
AN in addition to this diagram the SR Cu/Pd ratio for Various T-SP and
T-AN is given for slow and fast annealing modes at long and short pre
treatment periods. Three phase diagrams comparing experimental surface
properties for each of the SR, TL and 3SSL with bulk composition are
presented.