GROWTH OF YTTRIUM-OXIDE THIN-FILMS FROM BETA-DIKETONATE PRECURSOR

Yttrium oxide thin films were deposited in a flow-type ALE reactor fro m Y(thd)(3) (Hthd = 2,2,6,6-tetramethyl-3,5-heptanedione) and either o zone or oxygen. the influence of the substrate and source temperatures , pressure and pulse durations on the film growth on soda-lime and sil icon substrates was studied. Films were also grown on Coming glass, sa pphire and Si/CeO2 substrates to study the effect of the substrate on the growth rate and crystallinity of the films. Spectrophotometry, XRD and AFM were used to determine the optical properties, thickness, cry stallinity and surface morphology of the films. All the films deposite d with ozone were crystalline, but differences in preferential orienta tion depending on the substrate were observed. The growth rate with oz one was about 0.8 Angstrom cycle(-1) on all substrates except sapphire where it was higher. The films deposited with oxygen were less crysta lline and the growth rate was significantly lower than in depositions with ozone under the same growth conditions.