UNDERPOTENTIAL DEPOSITION OF LEAD ON POLYCRYSTALLINE PLATINUM AND ITSINFLUENCE ON THE OXYGEN REDUCTION REACTION

Citation
Sas. Machado et al., UNDERPOTENTIAL DEPOSITION OF LEAD ON POLYCRYSTALLINE PLATINUM AND ITSINFLUENCE ON THE OXYGEN REDUCTION REACTION, Electrochimica acta, 39(17), 1994, pp. 2591-2597
Citations number
23
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
39
Issue
17
Year of publication
1994
Pages
2591 - 2597
Database
ISI
SICI code
0013-4686(1994)39:17<2591:UDOLOP>2.0.ZU;2-T
Abstract
This work describes the study of underpotential deposition (upd) of Pb on polycrystalline platinum in 0.2 M HClO4 solutions using cyclic vol tammetry and rotating ring-disk electrode techniques. In such conditio ns, a full monolayer of upd Pb corresponds to a coverage of 0.41. The adsorption of lead inhibits the adsorption of hydrogen in a non-select ive way. This behavior was explained through the comparison between th e radius of the ad-atom and the substrate. It was calculated that each Pb ad-atom occupies two sites in the surface. Additionally it is show n that the presence of upd Pb significantly inhibits the oxygen reduct ion reaction. This effect was associated to the formation of H2O2 as t he final product, instead of H2O.