Sas. Machado et al., UNDERPOTENTIAL DEPOSITION OF LEAD ON POLYCRYSTALLINE PLATINUM AND ITSINFLUENCE ON THE OXYGEN REDUCTION REACTION, Electrochimica acta, 39(17), 1994, pp. 2591-2597
This work describes the study of underpotential deposition (upd) of Pb
on polycrystalline platinum in 0.2 M HClO4 solutions using cyclic vol
tammetry and rotating ring-disk electrode techniques. In such conditio
ns, a full monolayer of upd Pb corresponds to a coverage of 0.41. The
adsorption of lead inhibits the adsorption of hydrogen in a non-select
ive way. This behavior was explained through the comparison between th
e radius of the ad-atom and the substrate. It was calculated that each
Pb ad-atom occupies two sites in the surface. Additionally it is show
n that the presence of upd Pb significantly inhibits the oxygen reduct
ion reaction. This effect was associated to the formation of H2O2 as t
he final product, instead of H2O.