DEPOSITION OF MO FILMS BY ION-BEAM-ASSISTED EXCIMER-LASER PVD METHOD

Mo films were deposited by an excimer laser ablation method under diff erent conditions of laser fluences and target-substrate distances. The ir surface morphology was observed with scanning electron microscopy ( SEM). We also examined the adhesion of Mo films deposited on the subst rate with an ion beam preirradiation. Spectroscopy of Mo plume was car ried out. The main results obtained are as follows. (1) The adhesion o f the Mo films is improved by ion beam irradiation which removes thin surface layer on a substrate. (2) Smooth surface of Mo films without d roplet is successfully formed under the conditions of laser fluences o f less than 0.25 MJ/m2, target-substrate distances of longer than 40 m m, and with a target rotation. (3) Mo films with a b.c.c. structure sh ow the (110) preferred orientation of [110]. (4) Mo plume generated by laser ablation is in an excited state containing Mo+.