STRUCTURE INVESTIGATIONS OF XE-ADSORBATE LAYERS BY SPIN-POLARIZED LOW-ENERGY-ELECTRON DIFFRACTION .2. (ROOT-3X-ROOT-3)R30-DEGREES-XE PD(111) AND THE DILUTE PHASE OF XE PD(111)

Citation
G. Hilgers et al., STRUCTURE INVESTIGATIONS OF XE-ADSORBATE LAYERS BY SPIN-POLARIZED LOW-ENERGY-ELECTRON DIFFRACTION .2. (ROOT-3X-ROOT-3)R30-DEGREES-XE PD(111) AND THE DILUTE PHASE OF XE PD(111), Surface science, 322(1-3), 1995, pp. 207-220
Citations number
24
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
322
Issue
1-3
Year of publication
1995
Pages
207 - 220
Database
ISI
SICI code
0039-6028(1995)322:1-3<207:SIOXLB>2.0.ZU;2-Q
Abstract
The adsorbate systems (root 3 x root 3)R30 degrees-Xe/Pd(111) and the 'dilute' phase of Xe/Pd(111) were investigated with spin-polarized low -energy electron diffraction (SPLEED). Spin-polarized electrons from a GaAs source were scattered and the spin-dependent intensities were me asured. Comparative calculations were carried out by means of a relati vistic LEED program. The structure determination of (root 3 x root 3)R 30 degrees-Xe/Pd(111) yields a layer distance of 3.5+/-0.1 Angstrom, t he Xe atoms being adsorbed in hollow sites. In the 'dilute' phase of X e/Pd(111) the adsorbed Xe atoms occupy on-top sites with a Xe-Pd dista nce of 4.0+/-0.1 Angstrom without two-dimensional periodicity.