RADIO-FREQUENCY HOLLOW CATHODES FOR THE PLASMA PROCESSING TECHNOLOGY

Authors
Citation
L. Bardos, RADIO-FREQUENCY HOLLOW CATHODES FOR THE PLASMA PROCESSING TECHNOLOGY, Surface & coatings technology, 86-7(1-3), 1996, pp. 648-656
Citations number
52
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
86-7
Issue
1-3
Year of publication
1996
Part
2
Pages
648 - 656
Database
ISI
SICI code
0257-8972(1996)86-7:1-3<648:RHCFTP>2.0.ZU;2-T
Abstract
The present paper summarizes the main features of the hollow cathode d ischarges generated by a radio frequency (r.f.) instead of a d.c. held . The pressure of gas inside the hollow cathode is almost independent on the reactor pressure, which allows to generate discharge at high co llision frequency and transport it into the low pressure reactor. The discharge forced out from the hollow cathode forms a decaying plasma c hannel with extraordinary properties. Gas metastables excited inside t he cathode can act in selected gas mixtures as a source of additional heat, thereby enhancing thermionic electron emission and ionization of the gas. An are regime can be started from the glow discharge simply by increasing the r.f. power. Hollow cathode are in the cathode metal vapor can be sustained even without working gas. Examples of utilizati on of hollow cathodes in the film deposition and dry etching technolog y are presented. Small size cylindrical r.f. cathodes allow special ap plications inside narrow (<10 mm in diameter) tubes. Linear are discha rge (LAD) magnetrons.