Quantum-well detectors use intersubband transitions for the detection
of long-wavelength infrared radiation. Such quantum-well structures pr
ovide the electronic and optical properties for a new generation of in
frared quantum detectors. II is shown that apart from GaAs/GaAlAs mult
iquantum-well structures, which were studied extensively recently with
respect to their potential application for infrared detection, Si/SiG
e structures are suitable for this purpose as well. We have performed
a systematic experimental study of intersubband transitions in modulat
ion-doped p-type molecular beam epitaxy grown Si/SiGe quantum wells fo
r well widths between 26 Angstrom and 65 Angstrom and Ge contents in t
he range from 19% to 50%. Intersubband absorption occurs between 480 c
m(-1) and 1830 cm(-1) for such structures. The widths of the absorptio
n lines are only 20 meV as long as the excited states are confined wit
hin the SiGe wells. When the excited states lie already in the continu
um, a broadband photoresponse can be achieved. For this purpose Si/SiG
e structures with sufficiently narrow SiGe wells (about 30 Angstrom) d
oped to a level of p = 4 x 10(18) cm(-3) were used. Such structures ca
n be directly grown on Si (001) substrates and are highly compatible w
ith modem Si device fabrication technology which offers a tremendous a
dvantage for the realisation of large scale two-dimensional infrared d
etector arrays.