A NEW TECHNIQUE FOR DEPOSITION OF TITANIUM CARBONITRIDE FILMS AT ROOM-TEMPERATURE BY HIGH-ENERGY DENSITY PULSE PLASMA

Authors
YAN PX YANG SZ LI B CHEN XS
Citation
Px. Yan et al., A NEW TECHNIQUE FOR DEPOSITION OF TITANIUM CARBONITRIDE FILMS AT ROOM-TEMPERATURE BY HIGH-ENERGY DENSITY PULSE PLASMA, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 95(1), 1995, pp. 55-58
Citations number
6
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
95
Issue
1
Year of publication
1995
Pages
55 - 58
Database
ISI
SICI code
0168-583X(1995)95:1<55:ANTFDO>2.0.ZU;2-K
Abstract
Thin films of titanium carbonitride were deposited by high energy dens ity pulse plasma technique onto a No. 45 steel substrate at room tempe rature. The pulse plasma was generated from a coaxial plasma gun. The plasma has a high electron temperature, high electron density, high tr anslational speed and a short width of pulse. The mechanical propertie s of No. 45 steel were improved greatly by deposition titanium carboni tride films.