The paper describes a versatile relaxation spectroscopy technique for
solid interfaces based on the concurrent detection of two relaxation s
ignals, namely the total current through the external circuit versus t
he time or temperature, and the high-frequency capacitance of the spec
imen due to a relaxation of the nonequilibrium state about the interfa
ce. The technique is more accurate and yields more information than th
e traditional one. A block diagram of an automated facility built arou
nd a desk-top computer to implement the technique and process data is
given. The technique's efficiency is illustrated using the example of
nonequilibrium carrier generation and the thermal depolarization of th
e dielectric in Si MOS structures.