ION CHEMISTRY IN TETRAMETHYLSILANE (CH3)4SI

Citation
S. Mcginnis et al., ION CHEMISTRY IN TETRAMETHYLSILANE (CH3)4SI, Chemical physics letters, 232(1-2), 1995, pp. 99-102
Citations number
12
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
ISSN journal
00092614
Volume
232
Issue
1-2
Year of publication
1995
Pages
99 - 102
Database
ISI
SICI code
0009-2614(1995)232:1-2<99:ICIT(>2.0.ZU;2-6
Abstract
The cross sections for simple and dissociative ionization of tetrameth ylsilane ((CH3)4Si or TMS) by electron impact have been measured using Fourier-transform mass spectrometry. The total ionization cross secti on is 8.5 x 10(-16) cm2 between 30 and 70 eV. The molecular ion is Jah n-Teller unstable, with dissociative ionization to form (CH3)3Si+ domi nating the mass spectrum. CH3SiH2+ and CH3Si+ react rapidly with TMS t o produce (CH3)3Si+.(CH3)3Si+ does not react with TMS but is slowly hy drated by background water vapor.