Th. Liou et Fw. Chang, KINETICS OF CARBOTHERMAL REDUCTION AND NITRIDATION OF SILICON DIOXIDECARBON MIXTURE, Industrial & engineering chemistry research, 34(1), 1995, pp. 118-127
The carbothermal reduction and nitridation kinetics of silicon dioxide
/carbon pellet were studied under conditions of various reaction param
eters including gas now rate, pellet size, pellet-forming pressure, C/
SiO2 molar ratio, grain sizes of both carbon and silicon dioxide, and
reaction temperature by using a thermal gravimetric analysis (TGA) tec
hnique. The rate equation and kinetic model expressions of the nitrida
tion process in the chemical reaction-controlled region were presented
. The activation energy investigated in the temperature range between
1623 and 1748 K was 448 +/- 10 kJ/mol. The reaction-mechanism includin
g the formation of a gaseous SiO intermediate was also discussed. The
SiO formed from SiO2 being a rate-determining step was confirmed by ex
perimental results. These theoretical developments correlated sufficie
ntly with observed experimental results.