IN-SITU HIGH-TEMPERATURE CRYSTALLIZATION STUDY OF SPUTTER-DEPOSITED AMORPHOUS W-FE-C FILMS

Authors
TRINDADE B VIEIRA MT GROSSE EB
Citation
B. Trindade et al., IN-SITU HIGH-TEMPERATURE CRYSTALLIZATION STUDY OF SPUTTER-DEPOSITED AMORPHOUS W-FE-C FILMS, Acta metallurgica et materialia, 43(1), 1995, pp. 93-99
Citations number
25
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
Journal title
Acta metallurgica et materialia → ACNP
ISSN journal
09567151
Volume
43
Issue
1
Year of publication
1995
Pages
93 - 99
Database
ISI
SICI code
0956-7151(1995)43:1<93:IHCSOS>2.0.ZU;2-M
Abstract
The structural behaviour of amorphous W46Fe13C41 and W36Fe31C33 frlms produced by sputtering have been studied in situ during annealing up t o approximate to 950 degrees C by means of hot stage transmission elec tron microscopy. Differential thermal analysis and X-ray diffraction w ere used as complementary experimental techniques. The results are pre sented and correlated with the equilibrium phases anticipated from the W-Fe-C ternary phase diagram and with previous studies on similar fil ms deposited and annealed onto substrates.