FULLERENE FORMATION DURING PRODUCTION OF CHEMICAL-VAPOR-DEPOSITED DIAMOND

Authors
CHOW L WANG H KLECKLEY S DALY TK BUSECK PR
Citation
L. Chow et al., FULLERENE FORMATION DURING PRODUCTION OF CHEMICAL-VAPOR-DEPOSITED DIAMOND, Applied physics letters, 66(4), 1995, pp. 430-432
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
4
Year of publication
1995
Pages
430 - 432
Database
ISI
SICI code
0003-6951(1995)66:4<430:FFDPOC>2.0.ZU;2-8