VERY-LARGE-SCALE-INTEGRATION FABRICATION TECHNIQUE FOR BINARY-PHASE GRATINGS ON SAPPHIRE

Authors
STEVENS AJ HOSSACK WJ SAMUS S
Citation
Aj. Stevens et al., VERY-LARGE-SCALE-INTEGRATION FABRICATION TECHNIQUE FOR BINARY-PHASE GRATINGS ON SAPPHIRE, Applied optics, 34(1), 1995, pp. 190-193
Citations number
14
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
34
Issue
1
Year of publication
1995
Pages
190 - 193
Database
ISI
SICI code
0003-6935(1995)34:1<190:VFTFBG>2.0.ZU;2-8
Abstract
An efficient, high-yield process for the production of binary-phase ho lograms is presented by controlled deposition of silicon nitride over a sapphire substrate with the binary structure formed by plasma etch o f the silicon nitride. Optical results are presented for a 16 x 16 tra nsmission fanout element that shows near-optimal performance.