ATOMIC-SCALE STRUCTURE AND ELECTRONIC-PROPERTIES OF GAN GAAS SUPERLATTICES/

Citation
Rs. Goldman et al., ATOMIC-SCALE STRUCTURE AND ELECTRONIC-PROPERTIES OF GAN GAAS SUPERLATTICES/, Applied physics letters, 69(24), 1996, pp. 3698-3700
Citations number
22
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
24
Year of publication
1996
Pages
3698 - 3700
Database
ISI
SICI code
0003-6951(1996)69:24<3698:ASAEOG>2.0.ZU;2-H
Abstract
We have investigated the atomic-scale structure and electronic propert ies of GaN/GaAs superlattices produced by nitridation of a molecular b eam epitaxially grown GaAs surface. Using cross-sectional scanning tun neling microscopy (STM) and spectroscopy, we show that the nitrided la yers are laterally inhomogeneous, consisting of groups of atomic-scale defects and larger clusters. Analysis of x-ray diffraction data in te rms of fractional area of clusters (determined by STM), reveals a clus ter lattice constant similar to bulk GaN. In addition, tunneling spect roscopy on the defects indicates a conduction band state associated wi th an acceptor level of N-As in GaAs. Therefore, we identify the clust ers and defects as nearly pure GaN and N-As, respectively. Together, t he results reveal phase segregation in these arsenide/nitride structur es, in agreement with the large miscibility gap predicted for GaAsN. ( C) 1996 American Institute of Physics.