It is well known that the gain-bandwidth product of an avalanche photo
diode can be increased by utilizing a thin multiplication region. Prev
iously, measurements of the excess noise factor of InP/InGaAsP/InGaAs
avalanche photodiodes with separate absorption and multiplication regi
ons indicated that this approach could also be employed to reduce the
multiplication noise. This letter presents a systematic study of the n
oise characteristics of GaAs homojunction avalanche photodiodes with d
ifferent multiplication layer thicknesses. It is demonstrated that the
re is a definite ''size effect'' for multiplication regions less than
approximately 0.5 mu m. A good fit to the experimental data has been a
chieved using a discrete, nonlocalized model for the impact ionization
process. (C) 1996 American Institute of Physics.