INFLUENCE OF THE OXIDATION PROCESS ON THE LUMINESCENCE OF HF-TREATED POROUS SILICON

Citation
T. Dittrich et al., INFLUENCE OF THE OXIDATION PROCESS ON THE LUMINESCENCE OF HF-TREATED POROUS SILICON, Thin solid films, 255(1-2), 1995, pp. 149-151
Citations number
11
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
255
Issue
1-2
Year of publication
1995
Pages
149 - 151
Database
ISI
SICI code
0040-6090(1995)255:1-2<149:IOTOPO>2.0.ZU;2-Y
Abstract
HF-treated porous silicon (PS) was investigated in situ by photolumine scence (PL) in the red-orange region after treatments in various oxidi zing atmospheres. Oxidation in moist air induces a blue shift of the P L spectra with increasing oxidation time. The PL intensity of HF-treat ed PS decreases after treatment in dry oxygen. The PL intensity of HF- treated PS increases strongly after treatment in water atmosphere for treatment times up to 2 days and decreases for longer times, while the increase is enhanced in the red-orange region of the PL spectra. We f ound that the PL in the red-orange region of PS is correlated with the initial oxidation process of PS.