POROUS SILICON OBTAINED BY ANODIZATION IN THE TRANSITION REGIME

Citation
M. Bertolotti et al., POROUS SILICON OBTAINED BY ANODIZATION IN THE TRANSITION REGIME, Thin solid films, 255(1-2), 1995, pp. 152-154
Citations number
15
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
255
Issue
1-2
Year of publication
1995
Pages
152 - 154
Database
ISI
SICI code
0040-6090(1995)255:1-2<152:PSOBAI>2.0.ZU;2-M
Abstract
A process is presented based on anodization of silicon in the transiti on region between the porous silicon formation regime and the electrop olishing regime. Bright and stable photoluminescence was obtained on p (-), n(-) and p(+), n(+) (even degenerate) silicon. We report the phot oluminescence, IR absorbance and thermal diffusivity of porous silicon formed by anodizing in the transition regime the four types of silico n. Fourier transform IR and gravimetric investigations showed that ano dic silicon suboxide is formed on the surface. A model is proposed for the porous structure, which is suggested to consist of silicon crysta llites built inside an anodic oxide.