ELECTRONIC-PROPERTIES AND SCHOTTKY-BARRIER OF THE POROUS SILICON - AUINTERFACE

Authors
Citation
R. Laiho et A. Pavlov, ELECTRONIC-PROPERTIES AND SCHOTTKY-BARRIER OF THE POROUS SILICON - AUINTERFACE, Thin solid films, 255(1-2), 1995, pp. 276-278
Citations number
19
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
255
Issue
1-2
Year of publication
1995
Pages
276 - 278
Database
ISI
SICI code
0040-6090(1995)255:1-2<276:EASOTP>2.0.ZU;2-U
Abstract
We investigated the electrical properties of porous silicon layers pre pared on one side of a silicon single-crystal wafer and sandwiched wit h it between two 25 nm thick Au films. When a sum of a constant bias v oltage and a voltage pulse are applied over this structure it behaves like a capacitor, with the capacitance decreasing with increasing bias voltage, This phenomenon is attributed to interface defects between t he Au film and porous silicon. characterized by a Schottky barrier hei ght of 1.2 eV.