M. Sendovavassileva et al., STRUCTURAL AND LUMINESCENCE STUDIES OF STAIN-ETCHED AND ELECTROCHEMICALLY ETCHED GERMANIUM, Thin solid films, 255(1-2), 1995, pp. 282-285
Luminescence from stain-etched and electrochemically etched germanium
samples was observed in the blue part of the visible spectrum. Althoug
h it is weaker than the luminescence of porous silicon, its origin is
of scientific interest as a parallel to the luminescence of porous sil
icon. Stain-etched germanium was studied in more detail. Under visible
laser excitation the luminescence band is located around 525 nm. Anot
her luminescence band around 400 nm is observed with UV excitation. Th
e luminescence lifetime in the UV-excited band is of the order of 1 ms
, compared with about 100 ns in the band excited in the visible. The l
uminescence intensity either passes through a maximum or slowly decrea
ses as the temperature is increased from 8 to 300 K. This behaviour is
similar to that observed in porous silicon. The IR spectra of stain-e
tched Ge show the presence of GeO2, -OH groups and water. In the Raman
spectra the unmistakable bands of trigonal crystal GeO2 are observed.
A band at 760 cm(-1) in the Raman spectra and 752 cm(-1) in the IR sp
ectra could be assigned to substoichiometric regions and oxygen- vacan
cy complexes in GeO2. The chemical composition of the samples is chara
cterized by X-ray photoelectron spectroscopy (XPS) and secondary ion m
ass spectrometry ( SIMS). The XP spectra give evidence for GeO2 and Ge
O. SIMS data show the presence of both hydrogen and -OH groups. On the
basis of these data we propose that the luminescence of stain-etched
and electrochemically etched germanium is due to defects in GeO2.