LIGHT-EMITTING SI PREPARED BY LASER ANNEALING OF A-SI-H

Citation
Kma. Elkader et al., LIGHT-EMITTING SI PREPARED BY LASER ANNEALING OF A-SI-H, Thin solid films, 255(1-2), 1995, pp. 302-304
Citations number
10
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
255
Issue
1-2
Year of publication
1995
Pages
302 - 304
Database
ISI
SICI code
0040-6090(1995)255:1-2<302:LSPBLA>2.0.ZU;2-E
Abstract
We present time-resolved reflectivity, photoluminescence, dark conduct ivity and morphology studies of light-emitting Si prepared by pulsed X eCl laser irradiation of amorphous hydrogenated silicon (a-Si:H) depos ited on a silica substrate by glow discharge deposition. Laser-induced melting and recrystallization of the a-Si:H layers lead to visible ro om temperature photoluminescence, accompanied by an increase in dark c onductivity by more than three orders of magnitude. We investigate the influence of the number of applied laser pulses on the properties of the processed layers.