CROSS-LINKING IN HALOGEN-CONTAINING NOVOLAC ELECTRON-BEAM NEGATIVE RESISTS

Halogenophenol novolac (HPN)-based negative resists exhibit excellent sensitivity and pattern resolution properties. The HPNs act as synergi sts for crosslinking with other irradiation labile compounds such as n aphthoquinone diazide and bisazide vs. hydrogen halide (HX) eliminatio n reaction, resulting in additional crosslinking, probably by aryl rad ical recombination and/or addition. We describe a new resist formulati on based on HPN binder and melamine crosslinker (Cymel 303). In this c ase the irradiation induced HX elimination additionally catalyzes the melamine crosslinking.