KINETICS OF AG DISSOLUTION INTO EVAPORATED AS33S67 GLASS-FILMS

Authors
Citation
G. Dale et Pjs. Ewen, KINETICS OF AG DISSOLUTION INTO EVAPORATED AS33S67 GLASS-FILMS, Solid state communications, 93(8), 1995, pp. 685-689
Citations number
10
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
93
Issue
8
Year of publication
1995
Pages
685 - 689
Database
ISI
SICI code
0038-1098(1995)93:8<685:KOADIE>2.0.ZU;2-7
Abstract
The reaction/diffusion kinetics of Ag/As33S67 film couples are investi gated. Optical reflection is used to monitor the growth of the Ag-As-S reaction product layer stimulated by heating and white light illumina tion. Arrhenius plots indicate a thermally activated process with acti vation energies (E(A)) of 1.4eV during dark annealing and 0.2eV for an nealing in combination with white illumination. Additionally, interfer ometric reflection was demonstrated as an appropriate technique for mo nitoring the Ag-As-S layer growth during thermal dissolution-the prese nce of sinusoidal oscillations suggesting that the reacted (Ag-As-S) l ayer remains distinct throughout the process. In this case a clear squ are-root time dependence associated with a diffusion controlled proces s was identified.