MODELING THE SIMULTANEOUS PROCESS OF FORM ATION OF SILYCIDES AND HIDDEN INSULATING SI3N4 LAYERS IN THE REGIME OF HIGH-INTENSE ION-IMPLANTATION

Authors
KOMAROV AF KOMAROV FF FEDOTOV SA
Citation
Af. Komarov et al., MODELING THE SIMULTANEOUS PROCESS OF FORM ATION OF SILYCIDES AND HIDDEN INSULATING SI3N4 LAYERS IN THE REGIME OF HIGH-INTENSE ION-IMPLANTATION, Zurnal tehniceskoj fiziki, 64(9), 1994, pp. 136-143
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Zurnal tehniceskoj fiziki → ACNP
ISSN journal
00444642
Volume
64
Issue
9
Year of publication
1994
Pages
136 - 143
Database
ISI
SICI code
0044-4642(1994)64:9<136:MTSPOF>2.0.ZU;2-A