IN-SITU SPECTROSCOPIC ELLIPSOMETRY TO MONITOR THE PROCESS OF TINX THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING

Authors
LOGOTHETIDIS S ALEXANDROU I PAPADOPOULOS A
Citation
S. Logothetidis et al., IN-SITU SPECTROSCOPIC ELLIPSOMETRY TO MONITOR THE PROCESS OF TINX THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING, Journal of applied physics, 77(3), 1995, pp. 1043-1047
Citations number
24
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
3
Year of publication
1995
Pages
1043 - 1047
Database
ISI
SICI code
0021-8979(1995)77:3<1043:ISETMT>2.0.ZU;2-K