SURFACE PASSIVATION AND MICROROUGHNESS OF (100)SILICON ETCHED IN AQUEOUS HYDROGEN HALIDE (HF, HCL, HBR, HI) SOLUTIONS

Authors
LI L BENDER H TRENKLER T MERTENS PW MEURIS M VANDERVORST W HEYNS MM
Citation
L. Li et al., SURFACE PASSIVATION AND MICROROUGHNESS OF (100)SILICON ETCHED IN AQUEOUS HYDROGEN HALIDE (HF, HCL, HBR, HI) SOLUTIONS, Journal of applied physics, 77(3), 1995, pp. 1323-1325
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
3
Year of publication
1995
Pages
1323 - 1325
Database
ISI
SICI code
0021-8979(1995)77:3<1323:SPAMO(>2.0.ZU;2-O