We describe here a method for fabricating free-standing diamond membra
nes. Diamond films were deposited on a silicon substrate by microwave
plasma-assisted chemical vapor deposition and then part of the substra
te chemically removed. The films described here were 15 mm in diameter
with thickness of approximately 12 mu m. A novel feature of our appro
ach lies in the method used to obtain the selective dissolution of the
substrate; a container with O-rings was used, instead of masks, allow
ing a fast and clean isotropic dissolution of part of the silicon subs
trate. The deposited diamond films as well as the free-standing membra
nes were characterized by scanning and transmission electron microscop
y, electron diffraction and Raman spectroscopy.