Mg. Beghi et al., AGING EFFECTS OF THIN-FILMS PREPARED BY ION-BEAM-ASSISTED DEPOSITION - A MULTITECHNIQUE CHARACTERIZATION, Thin solid films, 291, 1996, pp. 401-405
Thin titanium nitride (TiN) films have been prepared by contemporaneou
s Ti evaporation and 30 keV N-2(+) implantation onto Si(100) wafers, i
n the presence of a N-2 partial atmosphere. The films have been charac
terized chemically and compositionally both by Auger electron spectros
copy (AES) and X-ray photoemission spectroscopy (XPS) checking the hom
ogeneity level, the degree of gaseous contamination, the different com
pounds formed mainly by titanium and their depth distribution. Brillou
in scattering measurements allowed determination of the Rayleigh veloc
ity at various angles of incidence. We also found evidence of a Sezawa
mode, confined in the overlayer. The films, which consist of a homoge
neous outer layer above a relatively wide interface region with the su
bstrate, show ageing effects. On a mesoscopic scale, film structure ap
pears porous.