AGING EFFECTS OF THIN-FILMS PREPARED BY ION-BEAM-ASSISTED DEPOSITION - A MULTITECHNIQUE CHARACTERIZATION

Citation
Mg. Beghi et al., AGING EFFECTS OF THIN-FILMS PREPARED BY ION-BEAM-ASSISTED DEPOSITION - A MULTITECHNIQUE CHARACTERIZATION, Thin solid films, 291, 1996, pp. 401-405
Citations number
10
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
291
Year of publication
1996
Pages
401 - 405
Database
ISI
SICI code
0040-6090(1996)291:<401:AEOTPB>2.0.ZU;2-B
Abstract
Thin titanium nitride (TiN) films have been prepared by contemporaneou s Ti evaporation and 30 keV N-2(+) implantation onto Si(100) wafers, i n the presence of a N-2 partial atmosphere. The films have been charac terized chemically and compositionally both by Auger electron spectros copy (AES) and X-ray photoemission spectroscopy (XPS) checking the hom ogeneity level, the degree of gaseous contamination, the different com pounds formed mainly by titanium and their depth distribution. Brillou in scattering measurements allowed determination of the Rayleigh veloc ity at various angles of incidence. We also found evidence of a Sezawa mode, confined in the overlayer. The films, which consist of a homoge neous outer layer above a relatively wide interface region with the su bstrate, show ageing effects. On a mesoscopic scale, film structure ap pears porous.