The possibilities of surface alloying of metals using high-temperature
pulsed plasma fluxes (HTPP) were investigated experimentally. The act
ion of HTPP fluxes with the specific power in the range (1 - 6) . 10(1
0) W/m2 and a pulse width of 15 to 20 mus upon the targets with prelim
inary deposited layers of alloying elements of 0.2 to 4.6 mum thick al
lows one to perform surface alloying of metals to depths of 20 to 45 m
um. The concentration of the introduced element can be as high as 20 w
t.%, depending on the type and thickness of predeposited element and t
he specific power of the incident beam.