TRAP-LIMITED INTERSTITIAL DIFFUSION AND ENHANCED BORON CLUSTERING IN SILICON

Authors
STOLK PA GOSSMANN HJ EAGLESHAM DJ JACOBSON DC POATE JM LUFTMAN HS
Citation
Pa. Stolk et al., TRAP-LIMITED INTERSTITIAL DIFFUSION AND ENHANCED BORON CLUSTERING IN SILICON, Applied physics letters, 66(5), 1995, pp. 568-570
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
5
Year of publication
1995
Pages
568 - 570
Database
ISI
SICI code
0003-6951(1995)66:5<568:TIDAEB>2.0.ZU;2-O