ADVANTAGE OF RAPID THERMAL ANNEALING OVER FURNACE ANNEALING FOR P-IMPLANTED METASTABLE SI GE0.12SI0.88/

Authors
LIE DYC SONG JH NICOLET MA THEODORE ND
Citation
Dyc. Lie et al., ADVANTAGE OF RAPID THERMAL ANNEALING OVER FURNACE ANNEALING FOR P-IMPLANTED METASTABLE SI GE0.12SI0.88/, Applied physics letters, 66(5), 1995, pp. 592-594
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
5
Year of publication
1995
Pages
592 - 594
Database
ISI
SICI code
0003-6951(1995)66:5<592:AORTAO>2.0.ZU;2-R