PRODUCTION OF AN INTENSE SLOW POSITRON BEAM BY USING AN ELECTRON LINAC AND ITS APPLICATIONS

Authors
KANAZAWA I ITO Y HIROSE M ABE H SUEOKA O TAKAMURA S ICHIMIYA A MURATA Y KOMORI F FUKUTANI K OKADA S HATTORI T
Citation
I. Kanazawa et al., PRODUCTION OF AN INTENSE SLOW POSITRON BEAM BY USING AN ELECTRON LINAC AND ITS APPLICATIONS, Applied surface science, 85(1-4), 1995, pp. 124-131
Citations number
13
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
85
Issue
1-4
Year of publication
1995
Pages
124 - 131
Database
ISI
SICI code
0169-4332(1995)85:1-4<124:POAISP>2.0.ZU;2-F
Abstract
An image of reemitted positrons has been produced in a proto-type posi tron transmission-type reemission microscope by using the electrostati c intense slow positron beam from an electron LINAC. RHEPD experiments have then been performed on H-terminated Si(111).