DEFECT PROFILING IN MULTILAYERED SYSTEMS USING MEAN DEPTH SCALING

Citation
Gc. Aers et al., DEFECT PROFILING IN MULTILAYERED SYSTEMS USING MEAN DEPTH SCALING, Applied surface science, 85(1-4), 1995, pp. 196-209
Citations number
29
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
85
Issue
1-4
Year of publication
1995
Pages
196 - 209
Database
ISI
SICI code
0169-4332(1995)85:1-4<196:DPIMSU>2.0.ZU;2-3
Abstract
Ghosh et al. recently proposed that positron stopping profiles in elem ents and elemental multilayers, calculated by Monte Carlo for incident positron energies in the range 1-10 keV, may be scaled onto energy in dependent curves using the mean implantation depth. It is shown here t hat Monte Carlo stopping profiles in elemental multilayer systems can be reproduced accurately in the incident energy range 1-25 keV using a modification of this scaling model that takes into account the backsc attering effects of interfaces. The mean depth scaling approach repres ents a saving of several orders of magnitude in the computation time f or multilayer stopping profiles and has been incorporated into a new d efect profiling program POSTRAP6.