MULTILAYERED NI HF AND SOLID-STATE AMORPHIZATION STUDIED USING THE SLOW POSITRON BEAM TECHNIQUE/

A monoenergetic slow positron beam was used to profile thin Ni/Hf mult ilayers. We measured the changes in the S-parameter of the Doppler bro adened positron annihilation radiation through the solid-state amorphi zation. It is shown that a high density of vacancy-type defects in Hf layers strongly induces the fast diffusion of Ni atoms.