ANALYSIS OF A FALLING FILM PHOTOREACTOR

A model has been developed for a falling-film photoreactor involving a gas-liquid reaction accompanied by a photochemical reaction. The actu al extent of enhancement in the rate of gas absorption due to dark and photochemical reactions and the influence of convection in the film h ave been taken into account. The exit gas-phase concentration as well as the gas-phase concentration profile within the falling-film photore actor have been predicted. The numerical simulation involved the inves tigation of effects of the variation of dimensionless groups character izing radiation intensity (photochemical kinetics), absorption charact eristics of liquid phase and dark reaction kinetics on the liquid-phas e and gas-phase concentration profiles.