EFFECTS OF DEPOSITION CONDITIONS ON TRANSPORT-PROPERTIES OF INTRINSICHYDROGENATED AMORPHOUS-SILICON AND HYDROGENATED AMORPHOUS-SILICON CARBIDE FILMS INVESTIGATED BY THE PHOTOMIXING TECHNIQUE

Citation
Y. Tang et R. Braunstein, EFFECTS OF DEPOSITION CONDITIONS ON TRANSPORT-PROPERTIES OF INTRINSICHYDROGENATED AMORPHOUS-SILICON AND HYDROGENATED AMORPHOUS-SILICON CARBIDE FILMS INVESTIGATED BY THE PHOTOMIXING TECHNIQUE, Applied physics letters, 66(6), 1995, pp. 721-723
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
66
Issue
6
Year of publication
1995
Pages
721 - 723
Database
ISI
SICI code
0003-6951(1995)66:6<721:EODCOT>2.0.ZU;2-4