POLY(DIVINYLSILOXYETHYLENE GLYCOL) - SYNTHESIS AND PHOTORESIST CHARACTERISTICS

Authors
AOKI H TOKUDA T NAGASAKI Y KATO M
Citation
H. Aoki et al., POLY(DIVINYLSILOXYETHYLENE GLYCOL) - SYNTHESIS AND PHOTORESIST CHARACTERISTICS, Macromolecular rapid communications, 18(1), 1997, pp. 31-36
Citations number
13
Categorie Soggetti
Polymer Sciences
Journal title
Macromolecular rapid communications → ACNP
ISSN journal
10221336
Volume
18
Issue
1
Year of publication
1997
Pages
31 - 36
Database
ISI
SICI code
1022-1336(1997)18:1<31:PG-SAP>2.0.ZU;2-T
Abstract
Poly(siloxyethylene glycol)) with pendant vinyl groups (PVSE) was syn thesized by polycondensation of oligo(ethylene glycol) (MW = 300) and diaminodivinylsilane. PVSE300 thus obtained is soluble in cold water. The PVSE300 coupled with a polythiol compound shows properties of a ne gative working photoresist. A negative tone image was obtained by deve lopment with water at 4 degrees C. PVSE300 is a new type of Si-contain ing polymer resist which can be developed by water.