Tm. Fromhold et Fw. Sheard, THEORY OF ASYMMETRY IN THE CURRENT-VOLTAGE CHARACTERISTICS OF LATERALLY GATED SUBMICRON RESONANT-TUNNELING DIODES, Superlattices and microstructures, 16(3), 1994, pp. 225-228
We investigate the current-voltage characteristic I(V) of a sub-micron
resonant tunneling diode with a lateral gate fabricated around the to
p contact. The application of a negative bias voltage to the lateral g
ate produces a confining potential in the plane of the barriers. This
potential leads to the formation of zero-dimensional states in the emi
tter accumulation layer and in the potential well. Because the lateral
gate is nearer the accumulation layer than the potential well, the de
gree of lateral confinement is different for electrons in the emitter
and in the well. Using two-dimensional parabolic potentials with diffe
rent characteristic frequencies to model the lateral confinement poten
tials and a simple model for the longitudinal potential variation, we
calculate the current-voltage characteristic for the device within the
Bardeen transfer Hamiltonian formalism. Our theory reproduces all the
essential features of experimental I(V) plots and in particular accou
nts for the observed asymmetry under reversal of the bias voltage V.