A 15 period, wurtzite-structure AlN-GaN reflector stack has been grown
on (100) GaAs by gas-source molecular beam epitaxy. A peak reflectanc
e of over 90% has been realised, in agreement with a matrix-method com
puter simulation. Our results support the feasibility of vertical Fabr
y-Perot cavity optoelectronics using nitride materials.