A MODIFIED METHOD FOR ARC DEPOSITION OF TI-N THIN-FILMS

Nearly stoichiometric dense Ti-M coatings with high microhardness and good adhesion on V2A substrates were deposited by reactive arc evapora tion. Substantial reduction of the size and surface number density of macroparticle inclusions, deleterious for some thin film applications, was achieved by magnetic are steering (using two low power consuming electromagnets) and by precise optimization of the reactive mode of de position. The adhesion of the coatings on V2A substrates was improved by depositing two interlayers: one of pure titanium and another with g raded composition, continuously varying from pure titanium to the comp osition of the final Ti-N coating. The arc technique proposed could fi nd successful industrial application for low scale production of wear- and corrosion-resistant coatings. Copyright (C) 1996 Published by Els evier Science Ltd.