DEPOSITION AND PROPERTIES OF TITANIUM NITRIDE FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING

Authors
MENG LJ AZEVEDO A DOSSANTOS MP
Citation
Lj. Meng et al., DEPOSITION AND PROPERTIES OF TITANIUM NITRIDE FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING, Vacuum, 46(3), 1995, pp. 233-239
Citations number
25
Categorie Soggetti
Physics, Applied
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
46
Issue
3
Year of publication
1995
Pages
233 - 239
Database
ISI
SICI code
0042-207X(1995)46:3<233:DAPOTN>2.0.ZU;2-3
Abstract
Titanium nitride films were prepared on glass substrates by dc reactiv e magnetron sputtering from a titanium metal target in an Ar+N-2 mixed atmosphere. During deposition, the total pressure was varied from 2x1 0(-3) to 3x10(-2) mbar. The effects of the total pressure on the struc tural, optical and electrical properties of the films were studied usi ng X-ray diffraction, scanning electron microscopy, reflectance spectr a and resistivity measurements.