OPTICAL AND MECHANICAL-PROPERTIES OF CARBON NITRIDE FILMS PREPARED BYION-ASSISTED ARE DEPOSITION AND MAGNETRON SPUTTERING

Citation
X. Wang et al., OPTICAL AND MECHANICAL-PROPERTIES OF CARBON NITRIDE FILMS PREPARED BYION-ASSISTED ARE DEPOSITION AND MAGNETRON SPUTTERING, Thin solid films, 256(1-2), 1995, pp. 148-154
Citations number
21
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
256
Issue
1-2
Year of publication
1995
Pages
148 - 154
Database
ISI
SICI code
0040-6090(1995)256:1-2<148:OAMOCN>2.0.ZU;2-J
Abstract
Carbon nitride films have been prepared by two different types of coat ing technique: ion-assisted are deposition and magnetron sputtering. T he optical properties and microhardness of the formed carbon nitride f ilms were studied. The results showed that, by both methods, nitrogen could be incorporated into the films to a maximum N-to-C ratio of 0.5. The refractive index and reflectance of the films were found to decre ase as the nitrogen content in the films increased, while the extincti on coefficient did not change significantly. When the N-2 gas was repl aced in the deposition process by H-2 gas, the films became more trans parent. The microhardness of the films was also decreased with increas ing nitrogen content and decreased further when the nitrogen was incor porated into films by higher energy N+ ion bombardment. In the magnetr on sputtering, the sputtering power had a marked effect on the optical properties of the formed films.