HIGH HEAT LOAD VACUUM-ULTRAVIOLET MIRROR DEVELOPMENT IN JAPAN

Citation
S. Sato et al., HIGH HEAT LOAD VACUUM-ULTRAVIOLET MIRROR DEVELOPMENT IN JAPAN, Optical engineering, 34(2), 1995, pp. 377-387
Citations number
35
Categorie Soggetti
Optics
Journal title
ISSN journal
00913286
Volume
34
Issue
2
Year of publication
1995
Pages
377 - 387
Database
ISI
SICI code
0091-3286(1995)34:2<377:HHLVMD>2.0.ZU;2-4
Abstract
Developments of vacuum ultraviolet (VUV) mirrors and optical elements for intense synchrotron radiation in Japan are reported. High heat loa d tests of chemical-vapor-deposited silicon carbide (CVD SIC) mirrors, 500 x 50 x 40 mm(3), were successfully made for undulator radiation w ith heat flux of 0.4 W/mm(2). As extensions of various CVD SiC mirrors developed at the Photon Factory, the largest CVD SIC mirror with sint ered SiC substrate, 1000 x 140 x 25 mm(3), and the thin CVD SIC mirror , 300 x 50 x 5 mm(3), were fabricated by the SP-ring 8 project. Heat l oad tests of a CVD-SiC-based grating and a multilayer mirror exhibit p ossibilities of making high heat load optical elements in the VUV and soft x-ray (SX) regions. Measurements of optical properties of CVD SIC mirrors produced by different methods showed that the optical constan ts in the VUV and SX regions were almost equal to one another. A profi lometer for measuring surface figures of large-size aspheric mirrors w as constructed on the basis of the Twyman-Green interferometer with he terodyne phase detection method.