IN-SITU SURFACE PROFILER FOR HIGH HEAT LOAD MIRROR MEASUREMENT

High heat loads on optical components in next-generation synchrotron r adiation sources will require the use of sophisticated methods to prev ent surface distortion that would degrade the intrinsic source brightn ess. In some cases it is desirable to be able to measure the mirror fi gure under actual operating conditions in ultrahigh vacuum. We propose to modify the standard long-trace profiler configuration to enable sc anning profiler measurement of mirrors under actual high heat load con ditions. The modification entails the use of a penta prism on a transl ation stage inside the vacuum chamber, with the optical head mounted o utside the chamber. This configuration is similar to the original penc il-beam interferometer system developed by von Bieren, but it contains a number of modifications that enhance its accuracy.